株式会社FLOSFIA
Kyoto, JP · 4 known investors
FLOSFIA develops power semiconductor devices based on corundum-structure gallium oxide (α-Ga₂O₃), a material originating from Kyoto University in Japan, using its proprietary water-based "MISTEPITAXY" mist deposition process to achieve lower loss than SiC at silicon-level cost. It targets applications starting with small power supplies and expanding to industrial equipment, power infrastructure, and mobility including electric vehicles.
Founders & leadership
人
人羅俊実創業者・取締役会長 (Founder & Chairman)
四
四戸孝代表取締役社長 (President & CEO)
Investors · 4
Frequently asked questions
- What does 株式会社FLOSFIA do?
- FLOSFIA develops power semiconductor devices based on corundum-structure gallium oxide (α-Ga₂O₃), a material originating from Kyoto University in Japan, using its proprietary water-based "MISTEPITAXY" mist deposition process to achieve lower loss than SiC at silicon-level cost. It targets applications starting with small power supplies and expanding to industrial equipment, power infrastructure, and mobility including electric vehicles.
- Who founded 株式会社FLOSFIA?
- 株式会社FLOSFIA was founded by 人羅俊実.
- Who are 株式会社FLOSFIA's investors?
- 株式会社FLOSFIA's investors include Kyoto University Innovation Capital, Miyako Capital, UTEC, Energy & Environment Investment.
- Where is 株式会社FLOSFIA headquartered?
- 株式会社FLOSFIA is headquartered in Kyoto, JP.